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dc.contributor.authorKöçkar, Hakan
dc.contributor.authorKaplan, Nadir
dc.contributor.authorKaraağac, Öznur
dc.date.accessioned2024-05-22T08:16:25Z
dc.date.available2024-05-22T08:16:25Z
dc.date.issued2023en_US
dc.identifier.issn0304-8853 / 1873-4766
dc.identifier.urihttps://doi.org/10.1016/j.jmmm.2023.171352
dc.identifier.urihttps://hdl.handle.net/20.500.12462/14675
dc.descriptionKöçkar, Hakan (Balikesir Author)en_US
dc.description.abstractThe nanostructured materials exhibit quite different properties from their bulk counterparts. Therefore, in this work, phase transition from a commercial austenitic AISI 202 (Bulk FeCrMn) stainless steel to martensitic ternary FeCrMn thin films under variation of deposition rate were studied. The films were easily sputtered onto a flexible amorphous polymer substrate from the target by a DC magnetron. X-ray diffraction analysis showed that austenitic phase of the target converted into a mixture of martensitic and a very weak of austenitic phase of the films at the deposition rates of 0.04 and 0.06 nm/s. With a further increase of the deposition rate, martensitic phase in the films increased, and at the highest deposition rate, the film with 100 % martensite phase was obtained. According to magnetic analysis, austenitic target consists of paramagnetic and ferromagnetic components as oppose to the paramagnetic phase stated in the literature. The films obtained by sputtering of austenitic target have ferromagnetic character with an increasing saturation magnetization, M-S as the deposition rate increases. The increase of the M-S from 117 to 346 emu.cm(-3) may be explained by the increase of the % martensite that may increase the ferromagnetic character. Also, the increase of the coercivity of the films from 31 to 196 Oe may have come from the increase of % martensite and the increase of grain sizes with increasing deposition rates which may induce the stress in the films. It is seen that the nanostructured ternary FeCrMn thin films exhibit quite different phase and corresponding magnetic properties from their bulk counterpart. With sputtering, martensitic phase transition of ternary FeCrMn thin films can be controlled by varying deposition rates. It presents a potential usage for data storage and micro electric-electronic devices on flexible substrates.en_US
dc.description.sponsorshipBalikesir University BAP 2016/132 2022/068 State Planning Organization/Turkiye 2005K120170en_US
dc.language.isoengen_US
dc.publisherElsevieren_US
dc.relation.isversionof10.1016/j.jmmm.2023.171352en_US
dc.rightsinfo:eu-repo/semantics/embargoedAccessen_US
dc.subjectDeposition Rateen_US
dc.subjectMagnetic Propertiesen_US
dc.subjectMartensitic Fecrmn Thin Filmsen_US
dc.subjectPhase Transitionen_US
dc.subjectSputtering Techniqueen_US
dc.subjectStructural Propertiesen_US
dc.titleMartensitic ternary FeCrMn thin films sputtered from austenitic AISI 202 stainless steel target: Phase transition and corresponding magnetic properties under the influence of deposition rateen_US
dc.typearticleen_US
dc.relation.journalJournal of Magnetism and Magnetic Materialsen_US
dc.contributor.departmentFen Edebiyat Fakültesien_US
dc.contributor.authorID0000-0002-4862-0490en_US
dc.contributor.authorID0000-0003-0789-3801en_US
dc.identifier.volume587en_US
dc.identifier.issueDecemberen_US
dc.identifier.startpage1en_US
dc.identifier.endpage6en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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