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dc.contributor.authorFerreyra, Romualdo A
dc.contributor.authorZhu, Congyong
dc.contributor.authorTeke, Ali
dc.contributor.authorMorkoc, Hadis
dc.date.accessioned2019-10-01T11:45:11Z
dc.date.available2019-10-01T11:45:11Z
dc.date.issued2017en_US
dc.identifier.issn978-3-319-48933-9; 978-3-319-48931-5
dc.identifier.urihttps://doi.org/ 10.1007/978-3-319-48933-9_31
dc.identifier.urihttps://hdl.handle.net/20.500.12462/6538
dc.descriptionTeke, Ali (Balikesir Author)en_US
dc.description.abstractOptical, electrical, mechanical, and thermal properties of group III nitrides, inclusive of AlN, GaN, InN and their ternary and quaternary alloys, are discussed. The driving force for group III nitride semiconductors is their important applications in optoelectronics, microwave amplifiers, and high voltage power switches. Owing to the aforementioned applications, the fundamental properties of each III nitride binary, as well as the alloys that have been acquired, are discussed in this chapter. In general, an appropriate assessment of the material properties for any material is not straightforward to begin with and the nitride family is no exception, particularly considering that group III nitrides are prepared on foreign substrates as low-cost native substrates are not yet available. Understandably, precise measurements of the mechanical, thermal, electrical and optical properties of the semiconductor nitride family are imperative for further advances. Notwithstanding the great progress that has already been made to further understand and exploit group III nitrides, especially GaN, reliable data for AlN and InN are still in the state of evolution, and naturally the subject of some controversy. This is, in part, a consequence of measurements having been performed on samples of widely varying quality. When possible, the spurious discrepancies have been disregarded. For some materials, too few measurements are available to yield a consensus, in which case the available data are simply reported. Defects in group III nitrides as well as GaN-based nanostructures are also discussed.en_US
dc.language.isoengen_US
dc.publisherSpringer International Publishing Agen_US
dc.relation.isversionof10.1007/978-3-319-48933-9_31en_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectMg-Doped Ganen_US
dc.subjectMolecular-Beam Epitaxyen_US
dc.subjectTime-Resolved Photoluminescenceen_US
dc.subjectLight-Emitting-Diodesen_US
dc.subjectP-Type Ganen_US
dc.subjectMonte-Carlo Calculationen_US
dc.subjectVapor-Phase-Epitaxyen_US
dc.subjectA-Plane Ganen_US
dc.subjectPositron-Annihilation Techniquesen_US
dc.subjectElectron Velocity Overshooten_US
dc.titleGroup III nitridesen_US
dc.typearticleen_US
dc.relation.journalSpringer Handbook of Electronic and Photonic Materials, 2nd Editionen_US
dc.contributor.departmentFen Edebiyat Fakültesien_US
dc.identifier.startpage743en_US
dc.identifier.endpage827en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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