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dc.contributor.authorLisesivdin, Sefer Bora
dc.contributor.authorAcar, Selim
dc.contributor.authorKasap, Mahmut
dc.contributor.authorÖzçelik, Süleyman
dc.contributor.authorGökden, Sibel
dc.contributor.authorÖzbay, Ekmel
dc.date.accessioned2019-10-17T10:36:52Z
dc.date.available2019-10-17T10:36:52Z
dc.date.issued2007en_US
dc.identifier.issn0268-1242
dc.identifier.urihttps://doi.org/10.1088/0268-1242/22/5/015
dc.identifier.urihttps://hdl.handle.net/20.500.12462/8182
dc.descriptionGökden, Sibel (Balikesir Author)en_US
dc.description.abstractHall effect measurements on undoped Al0.25Ga0.75N/GaN heterostructures grown by a metalorganic chemical vapour deposition (MOCVD) technique have been carried out as a function of temperature (20-350 K) and magnetic field (0-1.5 T). Magnetic field dependent Hall data were analysed using the quantitative mobility spectrum analysis (QMSA) technique. The mobility and density within the two-dimensional electron gas (2DEG) at the Al0.25Ga0.75N/GaN interface and within the underlying GaN layer were successfully separated by QMSA. Mobility analysis has been carried out using both the measured Hall data at a single field and the extracted data from QMSA. Analysis of the temperature-dependent mobility of 2DEG extracted from QMSA indicates that the interface roughness and alloy disorder scattering mechanisms are the dominant scattering mechanisms at low temperatures while at high temperatures only polar optical phonon scattering is the dominant mechanism. Al0.25Ga0.75N/GaN interface related parameters such as well width, deformation potential constant and correlation length were also accurately obtained from the fits of the simple analytical expressions of scattering mechanisms to the 2DEG mobility.en_US
dc.language.isoengen_US
dc.publisherIop Publishing Ltden_US
dc.relation.isversionof10.1088/0268-1242/22/5/015en_US
dc.rightsinfo:eu-repo/semantics/embargoedAccessen_US
dc.titleScattering analysis of 2DEG carrier extracted by QMSA in undoped Al0.25Ga0.75N/GaN heterostructuresen_US
dc.typearticleen_US
dc.relation.journalSemiconductor Science and Technologyen_US
dc.contributor.departmentFen Edebiyat Fakültesien_US
dc.contributor.authorID0000-0001-9635-6770en_US
dc.contributor.authorID0000-0001-9635-6770en_US
dc.contributor.authorID0000-0002-3761-3711en_US
dc.contributor.authorID0000-0003-4014-7800en_US
dc.identifier.volume22en_US
dc.identifier.issue5en_US
dc.identifier.startpage543en_US
dc.identifier.endpage548en_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US


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